Published in
American Institute of Physics, Journal of Applied Physics, 11(123), p. 113302
DOI: 10.1063/1.5001384
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Uniformity control of the deposition rate profile of a-Si:H film by gas velocity and temperature distributions in a capacitively coupled plasma reactor
Journal article published in 2018 by
Ho Jun Kim,
Hae June Lee 
This paper was not found in any repository, but could be made available legally by the author.
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