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American Chemical Society, Chemistry of Materials, 5(29), p. 2090-2100, 2017

DOI: 10.1021/acs.chemmater.6b04368

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Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

Journal article published in 2017 by René H. J. Vervuurt ORCID, Bora Karasulu ORCID, Marcel A. Verheijen, Wilhelmus (Erwin) M M. Kessels, Ageeth A. Bol ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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