Published in

Elsevier, Journal of Crystal Growth, (476), p. 58-63, 2017

DOI: 10.1016/j.jcrysgro.2017.08.006

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AlN grown on Si(1 1 1) by ammonia-molecular beam epitaxy in the 900–1200 °C temperature range

Journal article published in 2017 by Sebastian Tamariz ORCID, Denis Martin, Nicolas Grandjean
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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