Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

IOP Publishing, Journal of Physics D: Applied Physics, 3(50), p. 03LT02, 2016

Journal article published in 2016 by P. Luan, A. J. Knoll, H. Wang, V. S. S. K. Kondeti, P. J. Bruggeman

, G. S. Oehrlein

This paper is made freely available by the publisher.

Full text: Download

Preprint: archiving allowed

Upload

Postprint: archiving restricted

Upload

Published version: archiving forbidden

Policy details

Data provided by