Published in
IOP Publishing, Journal of Physics D: Applied Physics, 24(49), p. 245204
DOI: 10.1088/0022-3727/49/24/245204
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Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon
Journal article published in 2016 by
Stefan Tinck,
Annemie Bogaerts 
This paper was not found in any repository, but could be made available legally by the author.
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