Published in
IOP Publishing, Materials Research Express, 4(3), p. 046404
DOI: 10.1088/2053-1591/3/4/046404
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Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3interface
Journal article published in 2016 by
Jonas Deuermeier 
,
Thorsten J. M. Bayer,
Hiroshi Yanagi,
Asal Kiazadeh,
Rodrigo Martins,
Andreas Klein,
Elvira Fortunato
,
Thorsten J. M. Bayer,
Hiroshi Yanagi,
Asal Kiazadeh,
Rodrigo Martins,
Andreas Klein,
Elvira Fortunato
This paper was not found in any repository, but could be made available legally by the author.
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