Published in
American Institute of Physics, Journal of Applied Physics, 11(121), p. 115301
DOI: 10.1063/1.4978706
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Controlling silicon crystallization in aluminum-induced crystallization via substrate plasma treatment
Journal article published in 2017 by
Mel F. Hainey,
Jon-L. Innocent-Dolor,
Tanushree H. Choudhury,
Joan M. Redwing 
This paper is made freely available by the publisher.
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