Published in
American Institute of Physics, Applied Physics Letters, 17(109), p. 173502
DOI: 10.1063/1.4965848
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Effects of post-deposition vacuum annealing on film characteristics of p-type Cu2O and its impact on thin film transistor characteristics
Journal article published in 2016 by
Sanggil Han,
Kham M. Niang,
Girish Rughoobur 
,
Andrew J. Flewitt
,
Andrew J. Flewitt
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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