Reduction of silicon dioxide interfacial layer to 4.6Angstr�m EOT Al remote scavenging in high K/metal gate stacks on Si
Journal article published in 2013 by
Alexander Nichau,
Anna Sch�fer,
D. Buca,
Siegfried Mantl,
Lars Knoll,
Stephan Wirths,
T. Schram,
L. A. Ragnarsson,
J�rgen Schubert 
,
Patric Bernardy,
Martina Luysberg,
Astrid Besmehn
,
Patric Bernardy,
Martina Luysberg,
Astrid Besmehn
