Generation of hydrogen from solar irradiation has been identified as an attractive concept for many years and many studies have focused on photo-catalytic water splitting into H2 and O2 using semiconductor photo-catalysts. In this paper we report the deposition of Iron (III) oxide (Fe2O3) as the oxide semiconductor photo-catalyst. Fe2O3 is a low-cost semiconductor having high stability. We show that atmospheric pressure thermal CVD can achieve high growth rates and good control toward required material structures. Initial photo-response measurements are encouraging.