Ge and GeOx films as sacrificial layer for MEMS technology based on piezoelectric AlN: etching and planarization processes (Invited Paper)
Proceedings article published in 2005 by
J. Sangrador,
J. Olivares,
E. Iborra 
,
L. Vergara,
M. Clement,
A. Sanz-Hervas
,
L. Vergara,
M. Clement,
A. Sanz-Hervas
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