Published in
Metrology, Inspection, and Process Control for Microlithography XXVII
DOI: 10.1117/12.2012019
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Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures
Proceedings article published in 2013 by
Charles Settens,
Benjamin Bunday,
Brad Thiel,
R. Joseph Kline,
Daniel Sunday 
,
Chengqing Wang,
Wen-Li Wu,
Richard Matyi
,
Chengqing Wang,
Wen-Li Wu,
Richard Matyi
This paper was not found in any repository, but could be made available legally by the author.
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