Published in
EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon
DOI: 10.1109/ulis.2015.7063790
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Schottky barrier height engineering for next generation DRAM capacitors
Proceedings article published in 2015 by
Kyuho Cho,
Milan Pesic,
Steve Knebel,
Changhwa Jung,
Jaewan Chang,
Thomas Mikolajick,
Hanjin Lim,
Nadiia Kolomiiets 
,
Valeri V. Afanas'ev,
Uwe Schroeder
,
Valeri V. Afanas'ev,
Uwe Schroeder
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