Improvement of yield ratio of ohmic contact to GaAs/AlGaAs heterostructure by application of SiO2 protective layer
Journal article published in 2011 by
Takehiko Oe 
,
Kenjiro Matsuhiro,
Taro Itatani,
Sucheta Gorwadkar,
Syogo Kiryu,
Nobu-Hisa Kaneko
,
Kenjiro Matsuhiro,
Taro Itatani,
Sucheta Gorwadkar,
Syogo Kiryu,
Nobu-Hisa Kaneko
This paper is made freely available by the publisher.
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