Published in
Elsevier, Journal of Colloid and Interface Science, (393), p. 192-202
DOI: 10.1016/j.jcis.2012.10.070
Links
Tools
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
Journal article published in 2013 by
Dipu Borah,
Sozaraj Rasappa,
Ramsankar Senthamaraikannan,
Matthew T. Shaw,
Justin D. Holmes,
Michael A. Morris
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Postprint:
archiving forbidden
Published version:
archiving forbidden
Data provided by 