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American Institute of Physics, Applied Physics Letters, 13(109), p. 131902, 2016

DOI: 10.1063/1.4963132

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Formation of Ni3InGaAs phase in Ni/InGaAs contact at low temperature

Journal article published in 2016 by C. Perrin, E. Ghegin, S. Zhiou, F. Nemouchi, P. Rodriguez ORCID, P. Gergaud, P. Maugis, D. Mangelinck, K. Hoummada
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

The composition and morphology of the product phase after the reaction of Ni thin film with In0.53Ga0.47As substrate at 350 degrees C were investigated by atom probe tomography, X-ray diffraction, and scanning electron microscopy. Results show the formation of a unique Ni-3(In0.53Ga0.47) As phase with a low concentration in-depth gradient of Ni and the decoration of the grain boundaries by In atoms. These analyses indicate that Ni is the main diffusing specie during the growth of Ni-3(In0.53Ga0.47) As phase. The volume of the product phase is higher than the volume of the consumed Ni film as expected for the formation of Ni-3(In0.53Ga0.47) As phase. Published by AIP Publishing.