Published in
American Chemical Society, ACS Applied Materials and Interfaces, 5(9), p. 4948-4955, 2017
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Low Temperature Wet Conformal Nickel Silicide Deposition for Transistor Technology through an Organometallic Approach
Journal article published in 2017 by
Tsung-Han Lin,
Tigran Margossian 
,
Michele De Marchi,
Maxime Thammasack,
Dmitry Zemlyanov,
Sudhir Kumar ,
Jakub Jagielski ,
Li-Qing Zheng,
Chih-Jen Shih ,
Renato Zenobi,
Giovanni De Micheli,
David Baudouin,
Pierre-Emmanuel Gaillardon,
Christophe Cop,
Christophe Copéret
,
Michele De Marchi,
Maxime Thammasack,
Dmitry Zemlyanov,
Sudhir Kumar ,
Jakub Jagielski ,
Li-Qing Zheng,
Chih-Jen Shih ,
Renato Zenobi,
Giovanni De Micheli,
David Baudouin,
Pierre-Emmanuel Gaillardon,
Christophe Cop,
Christophe Copéret
This paper was not found in any repository, but could be made available legally by the author.
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- Must obtain written permission from Editor
- Must not violate ACS ethical Guidelines
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