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2012 IEEE International Reliability Physics Symposium (IRPS)

DOI: 10.1109/irps.2012.6241779

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Impact of Hot Electrons on the Reliability of AlGaN/GaN High Electron Mobility Transistors

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

This paper reports on an extensive analysis of the degradation of AlGaN/GaN HEMTs submitted to on-state stress tests. By means of combined electrical and electroluminescence characterization we demonstrate that: (i) exposure to on-state stress can induce a remarkable decrease in drain current; (ii) degradation rate strongly depends on the intensity of the EL signal emitted by the devices during stress, while it has a negligible dependence on temperature. On the basis of the experimental evidence collected within this work, degradation is ascribed to electron trapping in the gate-drain access region, induced by hot electrons. Finally, we derived an acceleration law for GaN HEMT degradation, by using the intensity of the EL signal as a measure of the stress acceleration factor.