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American Institute of Physics, Journal of Applied Physics, 13(119), p. 135308

DOI: 10.1063/1.4945032

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Effect of the order of He+ and H+ ion co-implantation on damage generation and thermal evolution of complexes, platelets, and blisters in silicon

Journal article published in 2016 by N. Daghbouj ORCID, N. Cherkashin ORCID, F.-X. Darras, V. Paillard, M. Fnaiech, A. Claverie
This paper is available in a repository.
This paper is available in a repository.

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