Published in
Society of Photo-optical Instrumentation Engineers, Proceedings of SPIE
DOI: 10.1117/12.778163
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Implementing a framework to generate a unified OPC from different EDA vendors for 45nm node and beyond
Proceedings article published in 2008 by
Shady Abdel Wahed,
Mohamed Al-Iman,
Rami Fathy,
Nader Hindawy,
Jochen Schacht,
Regina Shen,
Chia Wei Huang,
Pei Ru Tsai,
Te Hung Wu,
Chuen Huei Yang
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving forbidden
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