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The Electrochemical Society, ECS Transactions, 9(50), p. 779-782, 2013

DOI: 10.1149/05009.0779ecst

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Long Wavelength {greater than or equal to}1.9  m Germanium for Optoelectronics Using Process Induced Strain

Journal article published in 2013 by P. Velha, K. F. Gallacher, D. C. Dumas, D. J. Paul ORCID, M. Myronov, D. R. Leadley
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

The photoluminescence of tensile strained germanium nanostructures is reported. Sub-micron gratings and pillars were fabricated before bein embedded in a strained silicon nitride films. Using different deposition conditions and different sizes of structures the stress in the nanostructures can be controlled. The measured optical properties of the samples show that the direct band-gap is shifted drastically towards higher wavelength over 1.9 um wavelength. This process of local control of the stress in germanium nanostructures is compatible with integrated photonic devices in waveguides geometry. That opens the route for both emitters and photo-detectors above 1.6 um wavelength which are not easily available and also potentially towards a germanium laser.