Published in
IOP Publishing, Plasma Sources Science and Technology, 1(22), p. 015009, 2012
DOI: 10.1088/0963-0252/22/1/015009
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Effect of voltage pulse characteristics on high-power impulse magnetron sputtering of copper
Journal article published in 2012 by
Tomáš Kozák 
,
Jaroslav Vlček
,
Jaroslav Vlček
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