Published in

2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184)

DOI: 10.1109/vlsit.2001.934932

Links

Tools

Export citation

Search in Google Scholar

W/WN/poly gate implementation for sub-130 nm vertical cell DRAM

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

Full text: Unavailable

Green circle
Preprint: archiving allowed
Green circle
Postprint: archiving allowed
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO