Published in
International Conferencre on Simulation of Semiconductor Processes and Devices
DOI: 10.1109/sispad.2002.1034553
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A new non-pair diffusion based dopant pile-up model for process designers and its prediction accuracy
Journal article published in 1970 by
H. Hayashi,
N. Miura,
H. Komatsubara,
M. Mochizuki,
K. Fukuda 
,
Physics Japan Society Of Applied
,
Physics Japan Society Of Applied
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