Published in
American Chemical Society, Journal of The American Society for Mass Spectrometry, 8(26), p. 1283-1290, 2015
DOI: 10.1007/s13361-015-1159-1
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Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
Journal article published in 2015 by
Zhaoying Wang,
Bingwen Liu,
Evan W. Zhao,
Ke Jin,
Yingge Du,
James J. Neeway 
,
Joseph V. Ryan,
Dehong Hu ,
Kelvin H. L. Zhang,
Mina Hong,
Solenne Le Guernic,
Suntharampilai Thevuthasan,
Fuyi Wang,
Zihua Zhu
,
Joseph V. Ryan,
Dehong Hu ,
Kelvin H. L. Zhang,
Mina Hong,
Solenne Le Guernic,
Suntharampilai Thevuthasan,
Fuyi Wang,
Zihua Zhu
This paper is made freely available by the publisher.
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