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Wiley-VCH Verlag, Chemical Vapor Deposition, 5(10), p. 253-255, 2004

DOI: 10.1002/cvde.200304174

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Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-amidovanadium and Cyclohexylphosphine

This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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