Published in
Elsevier, Microelectronics Reliability, 4(52), p. 711-717
DOI: 10.1016/j.microrel.2011.11.008
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Characterization of fatigued Al lines by means of SThM and XRD: Analysis using fast Fourier transform
Journal article published in 2012 by
R. F. Szeloch,
P. Janus,
J. Serafińczuk 
,
P. M. Szecówka,
G. Jóźwiak
,
P. M. Szecówka,
G. Jóźwiak
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