Effect of low temperature and concentration KOH etching on high aspect ratio silicon structures
Journal article published in 2010 by
Thomas Defforge 
,
Loïc Coudron,
Gaël Gautier,
Sébastien Kouassi,
Wilfried Vervisch,
François Tran Van,
Laurent Ventura
,
Loïc Coudron,
Gaël Gautier,
Sébastien Kouassi,
Wilfried Vervisch,
François Tran Van,
Laurent Ventura
This paper is made freely available by the publisher.
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