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Wiley, Plasma Processes and Polymers, 12(7), p. 1022-1029, 2010

DOI: 10.1002/ppap.201000091

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Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges

This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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