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Elsevier, Journal of Alloys and Compounds, (550), p. 258-262

DOI: 10.1016/j.jallcom.2012.09.134

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Influence of the substrate bias voltage on the physical properties of dc reactive sputtered Ta2O5 films

Journal article published in 2013 by K. Cang, L. Y. Liang ORCID, Z. M. Liu, L. Wu, H. Luo, H. T. Cao, Y. S. Zou
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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