Published in

Trans Tech Publications, Materials Science Forum, (514-516), p. 284-288, 2006

DOI: 10.4028/www.scientific.net/msf.514-516.284

Trans Tech Publications, Materials Science Forum, p. 284-288

DOI: 10.4028/0-87849-402-2.284

Links

Tools

Export citation

Search in Google Scholar

CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties

Journal article published in 2006 by A. F. Mota, António J. Silvestre ORCID, Pedro M. Sousa, Olinda Conde ORCID, M. Alexandra Rosa, Margarida Godinho
This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Red circle
Preprint: archiving forbidden
Red circle
Postprint: archiving forbidden
Green circle
Published version: archiving allowed
Upload
Policy details
Data provided by SHERPA/RoMEO

Abstract

This work reports on the synthesis of CrO2 thin films by atmospheric pressure CVD using chromium trioxide (CrO3) and oxygen. Highly oriented (100) CrO2 films containing highly oriented (0001) Cr2O3 were grown onto Al2O3(0001) substrates. Films display a sharp magnetic transition at 375 K and a saturation magnetization of 1.92 Bohr magnetons per f.u., close to the bulk value of 2 Bohr magnetons per f.u. for the CrO2. Keywords: Chromium dioxide (CrO2), Atmospheric pressure CVD, Spintronics. ; Comment: 5 pages, 6 figures