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Elsevier, Surface and Coatings Technology, 1-3(61), p. 139-143

DOI: 10.1016/0257-8972(93)90216-b

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Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-V

Journal article published in 1993 by William D. Sproul, Michael E. Graham, Ming-Show Wong, Paul J. Rudnik
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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