ABSTRACTEpitaxial thin films of Yba₂Cu₃O₇ (YBCO) have been deposited and patterned on (100) SrTiO₃ and (110) NdGaO₃ substrates. Wet etchants used in conventional photolithography react too quickly with YBCO thin films, resulting in undercutting of patterned structures. We have implemented a technique to pattern thin lines from films without wet or dry etching. Chromium is evaporated onto the substrates and subsequently patterned. YBCO is then deposited by pulsed laser deposition, which results in an epitaxial YBCO film on patterned areas and randomly oriented YBCO deposited on chromium. An annealing step is required for the chromium to diffuse through the undesired YBCO in order to render those sections insulating. YBCO lines patterned with this technique exhibit resistivity and critical temperatures similar to those of the unpatterned films. As we decrease the width of the YBCO lines, the effect of the edges, where there is chromium-reacted material, on transport becomes more pronounced. The resolution of the patterning technique and the profile of superconducting versus non-superconducting materials at the edges is presented.