A novel approach is presented for introducing a surface morphology with beneficial light scattering properties to sputter-deposited ZnO:Al films, being used as front contact in Si thin film photovoltaic devices. Electrochemical anodization was used to trigger local corrosion, leading to interfacial structures complementary to those commonly prepared by an etching step in diluted HCl. By systematic variation of electrochemical etching conditions and electrolytes, sensible experimental parameters were evaluated for the preparation of ZnO films that can be applied in Si thin film solar cells. The prepared films were characterized by scanning electron microscopy, four-point resistance and Hall measurements. Furthermore, the kinetics of the heterogeneous interfacial reaction during the corrosion process were studied utilizing electroanalytical techniques. This allowed the identification of the processes occurring at the solid/liquid interface. Application of such films in microcrystalline Si single junction solar cells has shown promising initial results.