Published in
The Electrochemical Society, Electrochemical and Solid-State Letters, 10(12), p. G65
DOI: 10.1149/1.3186643
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Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics
Journal article published in 2009 by
Z. L. Pei,
L. Pereira,
G. Gonçalves,
P. Barquinha 
,
N. Franco,
E. Alves,
A. M. B. Rego ,
R. Martins,
E. Fortunato
,
N. Franco,
E. Alves,
A. M. B. Rego ,
R. Martins,
E. Fortunato
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