Published in

Springer, Journal of Materials Research, 11(6), p. 2371-2374, 1991

DOI: 10.1557/jmr.1991.2371

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Application of the bond valence method to Si/NiSi2 interfaces

Journal article published in 1991 by M. O'Keeffe ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

It is shown how the bond valence method can be used to estimate expected interatomic distances in coherent interfaces. The method is illustrated by application to the Si/NiSi2 (111) interface with results generally in accord with experimental data.