Wiley, Journal of the American Ceramic Society, 6(89), p. 1876-1882, 2006
DOI: 10.1111/j.1551-2916.2006.01048.x
Full text: Unavailable
We report a process for preparing microdot arrays of SiO2 from a tetraethoxysilane precursor containing either a cationic (CTAB) or non-ionic surfactant. Controlling the ink jet deposition parameters and precursor hydrolysis made it possible to obtain mesoporous silica with a Pm3n cubic structure, using CTAB, or an Fmmm orthorhombic structure, using a nonionic surfactant. The addition of hydrophobic organosilane F3C(CF2 )5CH2CH2Si(OC2H5 )3 leads to the most regular and best-defined three-dimensional microdot array with a constant diameter of 155 lm and a regular space of 250 lm.