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American Scientific Publishers, Journal of Nanoscience and Nanotechnology, 3(11), p. 1968-1975

DOI: 10.1166/jnn.2011.3118

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Using Chemical-Mechanical Polishing for Planarizing a High-κ Nanocomposite Polyimide Insulator for Organic Thin Film Transistors Application

Journal article published in 2011 by Wen-Hsi Lee, Chun Chieh Wang, Sao-De Liu
Distributing this paper is prohibited by the publisher
Distributing this paper is prohibited by the publisher

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