Published in
The Electrochemical Society, Journal of The Electrochemical Society, 10(146), p. 3788-3793, 1999
DOI: 10.1149/1.1392551
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Effects of the Final Oxidation Step on N and O Distributions in Silicon Oxide/Nitride/Oxide Ultrathin Films
Journal article published in 1999 by
C. Radtke,
T. D. M. Salgado,
C. Krug,
J. de Andrade 
,
I. J. R. Baumvol
,
I. J. R. Baumvol
This paper is made freely available by the publisher.
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