Published in
Institute of Electrical and Electronics Engineers, Proceedings of the IEEE, 7(93), p. 1364-1373, 2005
DOI: 10.1109/jproc.2005.851533
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Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays
Journal article published in 2005 by
A. J. Flewitt 
,
W. I. Milne
,
W. I. Milne
This paper was not found in any repository, but could be made available legally by the author.
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