Published in
2014 IEEE International Electron Devices Meeting
DOI: 10.1109/iedm.2014.7047097
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Microscopic understanding of the low resistance state retention in HfO2 and HfAlO based RRAM
Proceedings article published in 2014 by
B. Traore 
,
P. Blaise,
E. Vianello,
H. Grampeix,
A. Bonnevialle,
E. Jalaguier,
G. Molas,
S. Jeannot,
L. Perniola,
B. DeSalvo,
Y. Nishi
,
P. Blaise,
E. Vianello,
H. Grampeix,
A. Bonnevialle,
E. Jalaguier,
G. Molas,
S. Jeannot,
L. Perniola,
B. DeSalvo,
Y. Nishi
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