Published in
2014 IEEE International Electron Devices Meeting
DOI: 10.1109/iedm.2014.7047035
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Scaling breakthrough for analog/digital circuits by suppressing variability and low-frequency noise for FinFETs by amorphous metal gate technology
Proceedings article published in 2014 by
Takashi Matsukawa,
Koichi Fukuda 
,
Yongxun Liu,
Y. X. Liu,
Junichi Tsukada,
Hiromi Yamauchi,
Yuki Ishikawa,
Kazuhiko Endo,
Shin-Ichi O'uchi,
Shinji Migita,
Wataru Mizubayashi,
Yukinori Morita,
Hiroyuki Ota,
Meishoku Masahara,
Ieee
,
Yongxun Liu,
Y. X. Liu,
Junichi Tsukada,
Hiromi Yamauchi,
Yuki Ishikawa,
Kazuhiko Endo,
Shin-Ichi O'uchi,
Shinji Migita,
Wataru Mizubayashi,
Yukinori Morita,
Hiroyuki Ota,
Meishoku Masahara,
Ieee
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