Published in

2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)

DOI: 10.1109/icemelec.2014.7151183

Links

Tools

Export citation

Search in Google Scholar

Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors

Proceedings article published in 2014 by Sibani Bisoyi, Shree Prakash Tiwari ORCID, Ute Zschieschang, Hagen Klauk
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

Full text: Unavailable

Green circle
Preprint: archiving allowed
Green circle
Postprint: archiving allowed
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO