Published in
2015 China Semiconductor Technology International Conference
DOI: 10.1109/cstic.2015.7153360
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K=0.266 immersion lithography patterning and its challenge for NAND FLASH
Proceedings article published in 2015 by
Huayong Hu,
Weiming He,
Gaorong Li,
Nannan Zhang,
Liwan Yue,
Lei Ye,
Jinhua Pei,
Qiang Wu
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