Dissemin is shutting down on January 1st, 2025

Published in

IOP Publishing, Japanese Journal of Applied Physics, 6(48), p. 06FF15, 2009

DOI: 10.1143/jjap.48.06ff15

Links

Tools

Export citation

Search in Google Scholar

Fine and Large Coulomb Diamonds in a Silicon Quantum Dot

This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

We experimentally study the transport properties of silicon quantum dots (QDs) fabricated from a highly doped n-type silicon-on-insulator wafer. Low noise electrical measurements using a low temperature complementary metal-oxide-semiconductor (LTCMOS) amplifier are performed at 4.2 K in liquid helium. Two series of Coulomb peaks are observed: long-period oscillations and fine structures, and both of them show clear source drain voltage dependence. We also observe two series of Coulomb diamonds having different periodicity. The obtained experimental results are well reproduced by a master equation analysis using a model of double QDs coupled in parallel. ; Comment: 5 pages, 4 figures, to appear in Jpn. J. Appl. Phys