Published in
American Chemical Society, Journal of the American Chemical Society, 33(133), p. 12922-12925, 2011
DOI: 10.1021/ja203553n
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Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 °C Si-Technology Integration Barrier
Journal article published in 2011 by
Christopher De Dobbelaere,
Maria Lourdes Calzada,
Ricardo Jiménez,
Jesús Ricote 
,
Iñigo Bretos,
Jules Mullens,
An Hardy,
Marlies K. Van Bael
,
Iñigo Bretos,
Jules Mullens,
An Hardy,
Marlies K. Van Bael
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