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Elsevier, Applied Surface Science, (354), p. 298-305

DOI: 10.1016/j.apsusc.2015.06.167

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Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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