Published in
Wiley-VCH Verlag, Chemical Vapor Deposition, 1(7), p. 25-28, 2001
DOI: 10.1002/1521-3862(200101)7:1<25::aid-cvde25>3.0.co;2-o
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Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors
Journal article published in 2001 by
X. Liu,
S.-M. Peng,
P.-F. Hsu,
J. R. Babcock,
Y. Chi 
,
M. A. Lane,
J. A. Belot,
T.-W. Lin,
A. W. Ott,
C.-S. Liu,
M. V. Metz,
C. R. Kannewurf,
A. J. Carty,
R. P. H. Chang,
T. J. Marks
,
M. A. Lane,
J. A. Belot,
T.-W. Lin,
A. W. Ott,
C.-S. Liu,
M. V. Metz,
C. R. Kannewurf,
A. J. Carty,
R. P. H. Chang,
T. J. Marks
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