Si-Ion Implantation Doping in β-Ga<sub>2</sub>O<sub>3</sub>and Its Application to Fabrication of Low-Resistance Ohmic Contacts
Journal article published in 2013 by
Kohei Sasaki,
Masataka Higashiwaki 
,
Akito Kuramata,
Takekazu Masui,
Shigenobu Yamakoshi
,
Akito Kuramata,
Takekazu Masui,
Shigenobu Yamakoshi
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