Published in
Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 4(29), p. 297-299, 2008
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Plasma Treatment for Leakage Reduction in AlGaN/GaN and GaN Schottky Contacts
Journal article published in 2008 by
Rongming Chu 
,
Likun Shen,
N. Fichtenbaum,
D. Brown,
S. Keller,
U. K. Mishra
,
Likun Shen,
N. Fichtenbaum,
D. Brown,
S. Keller,
U. K. Mishra
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